Why HBM Hybrid Bonding Delays at Samsung and SK Hynix Hit Chip Equipment Makers
As AI demands push memory chips to their physical limits, a strategic delay in 'hybrid bonding' technology by major manufacturers has triggered a ripple effect across the semiconductor equipment market.
By Bo Feng
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On July 6, 2026, Dutch financial media and South Korean tech outlet ZDNet reported that memory giants Samsung and SK Hynix are weighing a delay in adopting "hybrid bonding" for their next-generation High Bandwidth Memory (HBM) chips.[1][2]
This strategic pivot immediately rippled through the semiconductor supply chain, sending shares of BE Semiconductor Industries (BESI)—a Dutch company that holds a first-mover advantage in hybrid bonding tools—down 7.5%.[1]
To understand why a delay in a niche manufacturing technique can erase hundreds of millions of dollars in market value, one must look inside the engine of the artificial intelligence boom. AI processors rely on HBM to feed them massive amounts of data at lightning speed, making memory packaging a critical bottleneck for global tech infrastructure.
HBM achieves this speed by stacking multiple DRAM memory dies on top of each other, much like floors in a skyscraper, with microscopic vertical wires called through-silicon vias running through them.[5]
Currently, these layers are connected using micro-bumps—tiny spheres of solder. Manufacturers use techniques like Thermal Compression bonding or SK Hynix's proprietary Mass Reflow Molded Underfill to melt these bumps and fuse the layers together.[3]
However, the AI industry is demanding ever-taller architectures. The upcoming HBM4 generation requires stacking 16 layers of memory. Under the strict physical height limits set by the JEDEC standards body—capped at 775 micrometers—fitting 16 layers using traditional solder bumps becomes a severe physics problem.[6]
Enter hybrid bonding. This cutting-edge technique eliminates the solder bumps entirely, connecting the copper pads of one chip directly to the copper pads of another.[1][5]
Hybrid bonding allows for interconnect pitches below 10 micrometers, significantly reducing the physical height of the stack while improving signal integrity and power efficiency.[5]
But the technology is notoriously difficult to master at scale. It requires perfectly flat surfaces, flawless chemical mechanical planarization, and a cleanroom environment devoid of even the smallest dust particles.
While SK Hynix recently verified a 12-die stack using hybrid bonding in its research labs, achieving the yields necessary for profitable mass production remains a steep hurdle for the entire industry.[3]
The turning point came when JEDEC recently relaxed its height specifications, giving memory makers a crucial window of flexibility to stick with proven methods.
Capitalizing on this relaxed standard, Samsung and SK Hynix are now prioritizing alternative thermal management technologies to extend the life of their existing bonding equipment.
Samsung is reportedly testing a dedicated thermal component called the Heat Path Block, while SK Hynix is developing a similar solution dubbed ICE HBM.[2]
These components sit alongside the memory stack to rapidly dissipate heat, addressing one of the primary bottlenecks of 16-layer stacks without requiring an immediate, multi-billion-dollar transition to hybrid bonding machines.
For equipment suppliers like BESI and its partner Applied Materials, the delay introduces near-term uncertainty, though analysts maintain that hybrid bonding remains the inevitable endgame for the subsequent HBM5 generation.[1]
Ultimately, this supply chain pivot highlights the pragmatic reality of semiconductor manufacturing. By innovating around thermal limits rather than forcing an unready technology into mass production, the industry is ensuring that the hardware powering the AI revolution continues to scale reliably.
Viewpoints in depth
Memory Manufacturers' Strategy
Prioritizing reliable yields and capital efficiency over unproven manufacturing techniques.
For giants like Samsung and SK Hynix, the race to supply Nvidia and other AI leaders is dictated by volume and reliability. Transitioning to hybrid bonding requires entirely new, highly sensitive production lines that are prone to yield issues in their early stages. By developing alternative cooling methods like the Heat Path Block and leveraging relaxed JEDEC height standards, these manufacturers can squeeze another generation of performance out of their existing, multi-billion-dollar Thermal Compression and MR-MUF equipment. This pragmatic approach minimizes supply chain disruptions during a critical period of AI infrastructure expansion.
The Equipment Suppliers' Case
Arguing that the physical limits of silicon make hybrid bonding an inevitable necessity.
Companies like BE Semiconductor Industries (BESI) and Applied Materials view the current delay as a temporary speed bump rather than a change in destination. They argue that while alternative cooling blocks may solve the heat issues for 16-layer HBM4, the subsequent move to 20-layer or 24-layer stacks in HBM5 will definitively break the physical height limits of traditional solder bumps. From their perspective, the massive R&D investments in copper-to-copper bonding remain secure, as the technology is the only known pathway to achieve the sub-10-micrometer interconnect pitches required for the next decade of AI computing.
Key points
- Reports indicate Samsung and SK Hynix are delaying the adoption of hybrid bonding for next-generation HBM4 memory chips.
- The news triggered a 7.5% sell-off in shares of BE Semiconductor Industries, a leading manufacturer of hybrid bonding equipment.
- Memory makers are instead developing alternative cooling solutions, such as Samsung's Heat Path Block, to extend the life of existing bonding techniques.
- The delay allows manufacturers to avoid the massive capital costs and yield risks associated with hybrid bonding in the near term.
What we don’t know
- Whether the alternative Heat Path Block (HPB) technology can be manufactured at sufficient scale to meet Nvidia's upcoming GPU timelines.
- The exact timeline for when hybrid bonding will become strictly mandatory, with estimates ranging from HBM4E to HBM5.
- How the delay will impact the long-term capital expenditure plans of secondary memory manufacturers like Micron.
How we got here
2024–2025
The AI boom drives unprecedented demand for HBM3 and HBM3E memory, straining global advanced packaging capacity.
April 2026
SK Hynix verifies a 12-layer HBM stack using hybrid bonding in R&D, but notes mass-production yields remain a challenge.
June 2026
JEDEC, the global microelectronics standards body, relaxes the physical height limits for upcoming HBM4 chips.
July 6, 2026
Reports emerge that Samsung and SK Hynix will delay hybrid bonding adoption, triggering a 7.5% sell-off in equipment maker BESI.
- Memory Manufacturers
- Focus on maximizing mass-production yields and managing capital expenditures by extending proven technologies.
- Equipment Suppliers
- Maintain that hybrid bonding is the inevitable long-term solution for the physical limits of AI memory.
- Industry Analysts
- View the delay as a pragmatic engineering pivot that balances next-generation AI demands with manufacturing realities.
Perspectives this story doesn't cover
- Nvidia and other AI chip designers awaiting HBM4 supply
- Smaller memory manufacturers unable to fund alternative cooling R&D
Sources
[1]Investing.comEquipment SuppliersBesi stock dips 7% on report of hybrid bonding adoption delay
Read on Investing.com →
[2]ZDNetMemory ManufacturersSamsung and SK deliberate on the timing of introducing hybrid bonding for HBM
[3]The ElecMemory ManufacturersSK Hynix verifies 12-die HBM stack bonded through hybrid bonding
Read on The Elec →
[4]BE Semiconductor IndustriesEquipment SuppliersBESI Investor Relations and Market Updates
Read on BE Semiconductor Industries →
[5]TechPowerUpIndustry AnalystsSamsung to Adopt Hybrid Bonding for HBM4
Read on TechPowerUp →
[6]DigiTimesMemory ManufacturersSamsung, SK Hynix reportedly ramp hybrid bonding push for next-gen HBM
Read on DigiTimes →
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